JPH0125220B2 - - Google Patents

Info

Publication number
JPH0125220B2
JPH0125220B2 JP55054069A JP5406980A JPH0125220B2 JP H0125220 B2 JPH0125220 B2 JP H0125220B2 JP 55054069 A JP55054069 A JP 55054069A JP 5406980 A JP5406980 A JP 5406980A JP H0125220 B2 JPH0125220 B2 JP H0125220B2
Authority
JP
Japan
Prior art keywords
wafer
reticle
alignment
semiconductor wafer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55054069A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5617019A (en
Inventor
Ban Pesuki Kurisuchian
Eru Meisenheimaa Uiriamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AMERIKAN SEMIKONDAKUTAA IKUITSUPUMENTO TEKUNOROJIIZU
Original Assignee
AMERIKAN SEMIKONDAKUTAA IKUITSUPUMENTO TEKUNOROJIIZU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AMERIKAN SEMIKONDAKUTAA IKUITSUPUMENTO TEKUNOROJIIZU filed Critical AMERIKAN SEMIKONDAKUTAA IKUITSUPUMENTO TEKUNOROJIIZU
Publication of JPS5617019A publication Critical patent/JPS5617019A/ja
Publication of JPH0125220B2 publication Critical patent/JPH0125220B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
JP5406980A 1979-05-11 1980-04-23 Method and apparatus for exposing semiconductor wafer Granted JPS5617019A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (2)

Publication Number Publication Date
JPS5617019A JPS5617019A (en) 1981-02-18
JPH0125220B2 true JPH0125220B2 (en]) 1989-05-16

Family

ID=21899427

Family Applications (3)

Application Number Title Priority Date Filing Date
JP5406980A Granted JPS5617019A (en) 1979-05-11 1980-04-23 Method and apparatus for exposing semiconductor wafer
JP57103657A Granted JPS5816531A (ja) 1979-05-11 1982-06-16 半導体ウエハ露光装置の位置決め装置
JP57103658A Granted JPS5816532A (ja) 1979-05-11 1982-06-16 位置決め装置

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP57103657A Granted JPS5816531A (ja) 1979-05-11 1982-06-16 半導体ウエハ露光装置の位置決め装置
JP57103658A Granted JPS5816532A (ja) 1979-05-11 1982-06-16 位置決め装置

Country Status (8)

Country Link
JP (3) JPS5617019A (en])
DE (1) DE3017582C2 (en])
FR (1) FR2456338B1 (en])
GB (2) GB2052767B (en])
IL (1) IL59629A (en])
IT (1) IT1212414B (en])
NL (1) NL8002009A (en])
SE (3) SE457034B (en])

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (ja) * 1988-02-22 1997-11-26 日本精工株式会社 露光装置の位置合わせ方法及び装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JP2546537B2 (ja) * 1994-06-20 1996-10-23 株式会社ニコン 投影露光装置及び方法
JP2006213107A (ja) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd 鞍乗り型車両

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (de) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Doppelobjektiv-Einrichtung zum Indeckungbringen einer Photomaske mit einer Unterlage wie einem Halbleiter-Plättchen
JPS4921467A (en]) * 1972-06-20 1974-02-25
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (ja) * 1975-07-25 1984-08-10 株式会社日立製作所 自動焦点合わせ装置
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Also Published As

Publication number Publication date
GB2052767B (en) 1983-06-08
IL59629A0 (en) 1980-06-30
JPS5617019A (en) 1981-02-18
SE456873B (sv) 1988-11-07
IT8021931A0 (it) 1980-05-09
NL8002009A (nl) 1980-11-13
IT1212414B (it) 1989-11-22
SE8800837L (sv) 1988-03-09
SE457034B (sv) 1988-11-21
FR2456338B1 (fr) 1986-05-09
DE3017582A1 (de) 1980-11-13
GB2111695A (en) 1983-07-06
GB2052767A (en) 1981-01-28
SE8800836D0 (sv) 1988-03-09
JPH0310221B2 (en]) 1991-02-13
SE8800837D0 (sv) 1988-03-09
JPS638609B2 (en]) 1988-02-23
JPS5816532A (ja) 1983-01-31
DE3017582C2 (de) 1986-07-31
FR2456338A1 (fr) 1980-12-05
JPS5816531A (ja) 1983-01-31
GB2111695B (en) 1984-01-11
IL59629A (en) 1983-03-31
SE8003424L (sv) 1980-11-12
SE8800836L (sv) 1988-03-09
SE456872B (sv) 1988-11-07

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